This presentation will outline the virtuous cycle of making and measuring nanostructures. This positive feedback loop improves the theory and practice of fabrication processes, device technologies, and microscopy measurements at the nanometer scale.
Specifically, the presentation will explore the combination of electron-beam lithography and atomic-force microscopy to make and measure standards that enable traceability in super-resolution optical microscopy, with applications to nanoparticle metrology.
About the presenter
Samuel M. Stavis, Ph.D., is the Leader of the NIST Nanostructure Fabrication and Measurement Group. He received a B.S.E. in Engineering Physics from the University of Michigan and a M.S. and Ph.D. in Applied Physics from Cornell University, where he was also a Postdoctoral Research Associate in Biological and Environmental Engineering. At Cornell, he performed early research in measuring fluorescence from single molecules in nanofluidic devices.
Stavis joined the NIST staff through a National Research Council Postdoctoral Research Associateship award. At NIST, he has advanced what is possible to make and measure at small scales. By developing and combining fabrication processes, device technologies, and microscopy methods, he has established new ways and limits of controlling and quantifying nanoscale systems. His research has diverse applications in manufacturing, healthcare, and the environment. He is an Editor of the Journal of Research of NIST and has received a Bronze Medal award, two Innovations in Measurement Science awards, and an Outstanding Authorship award from NIST.