NIST has established and is exploring a virtuous cycle of making and measuring nanostructures. This positive feedback loop improves the theory and practice of fabrication processes, device technologies, and microscopy measurements at the nanometer scale. In this talk, Stavis presents an ongoing example of this virtuous cycle, in which he and his team apply electron-beam lithography and focused ion-beam machining to fabricate standards for correlative atomic-force microscopy and superresolution optical microscopy.
The team's approach could extend nanometer traceability from NIST to ordinary instruments in research laboratories, with diverse applications ranging from photonic integration to nanoparticle metrology.
About the presenter
Samuel M. Stavis, Ph.D., is the leader of the NIST Nanostructure Fabrication and Measurement Group. He received a B.S.E. in engineering physics from the University of Michigan and an M.S. and a doctorate in applied physics from Cornell University, where he was also a postdoctoral research associate in biological and environmental engineering. At Cornell, he performed early research in measuring fluorescence from single molecules in nanofluidic devices.
Stavis joined the NIST staff through a National Research Council Postdoctoral Research Associateship award. At NIST, he has advanced what is possible to make and measure at small scales. By developing and combining fabrication processes, device technologies, and microscopy methods, he has established new ways and limits of controlling and quantifying nanoscale systems. His research has diverse applications in manufacturing, health care, and the environment. He is an editor of the Journal of Research of NIST
and has received a Bronze Medal Award, two Innovations in Measurement Science awards, and an Outstanding Authorship Award from NIST.