Key Considerations in Objective Selection for Machine Vision

Microscope objectives are critical for high magnification machine vision applications such as semiconductor inspection. There are different key considerations when choosing the right objective compared to selecting a conventional machine vision lens. Sischka covers different objective options and what to look for across different levels of system complexity. He addresses topics ranging from improving performance while balancing system size and weight with infinite conjugate objectives to integrating liquid lenses into objectives for electronic autofocus.

About the presenter
Nick Sischka is director of imaging product development at Edmund Optics in Cherry Hill, N.J. He oversees global strategy around the development of imaging products, determines which markets the imaging business line should pursue, and how these products and strategies work together with Edmund Optics’ other divisions. Additionally, Sischka serves as the A3 (Association for Advancing Automation) NextGen Chair and as a member the A3 Education Committee and he teaches the Basic Optics course for A3’s Certified Vision Professional (CVP) certification. He holds a Bachelor of Science in optical sciences and engineering from the University of Arizona.